Frank Staals
System Engineer
SPIE Involvement:
Author
Area of Expertise:
Lithography , Focus , Imaging
Publications (6)

PROCEEDINGS ARTICLE | March 16, 2016
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Reticles, Optical lithography, Data modeling, Visualization, Sensors, Scanners, Manufacturing, Image resolution, Time metrology, Photomasks, Semiconducting wafers, Product engineering, Performance modeling, Chemical mechanical planarization, Design for manufacturability

PROCEEDINGS ARTICLE | March 8, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Diffraction, Metrology, Optical lithography, Data modeling, Calibration, Scanners, Interfaces, Inspection, Photoresist materials, Process control, Finite element methods, Semiconducting wafers

PROCEEDINGS ARTICLE | September 4, 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Logic, Optical lithography, Sensors, Scanners, Printing, Photomasks, Semiconducting wafers, Product engineering, Electroluminescent displays, Polonium

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Metrology, Optical lithography, Etching, Scanners, Computer simulations, Scatterometry, Optical metrology, Critical dimension metrology, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Wafer-level optics, Data modeling, Sensors, Scanners, Silicon, Finite element methods, Photomasks, Convolution, Semiconducting wafers, Chemical mechanical planarization

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Reticles, 3D acquisition, Scanners, Wavefronts, Photomasks, Source mask optimization, Computational lithography, Optimization (mathematics), Semiconducting wafers, 3D image processing

Showing 5 of 6 publications
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