Dr. Frank Sundermann
Senior Lithography Engineer at STMicroelectronics
SPIE Involvement:
Author
Publications (42)

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Reticles, Logic, Inspection, Scanning electron microscopy, Transmission electron microscopy, Process control, Photomasks, Critical dimension metrology, Semiconducting wafers, Phase shifts, Defect inspection

SPIE Journal Paper | April 27, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Photomasks, Calibration, Optical proximity correction, Critical dimension metrology, Electroluminescence, Wafer-level optics, Semiconducting wafers, Data modeling, 3D modeling, Scanning electron microscopy

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Reticles, Metrology, Data modeling, Scanners, Image registration, Pellicles, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Wafer-level optics, Neck, Data modeling, Calibration, Photomasks, Optical proximity correction, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Process modeling

SPIE Journal Paper | April 10, 2015
JM3 Vol. 14 Issue 02
KEYWORDS: Semiconducting wafers, Optical lithography, Critical dimension metrology, Process control, Photomasks, Etching, Logic, Metrology, Lithography, Optical proximity correction

PROCEEDINGS ARTICLE | October 29, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Reticles, Metrology, Etching, Metals, Scanners, Image registration, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology

Showing 5 of 42 publications
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