Dr. Frank J. Timmermans
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII

Proceedings Article | 18 December 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Scanners, Manufacturing, Reflectivity, Ion beams, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics

SPIE Journal Paper | 1 October 2020
JM3 Vol. 19 Issue 04

Proceedings Article | 20 September 2020 Presentation
Proc. SPIE. 11518, Photomask Technology 2020
KEYWORDS: Reticles, Deep ultraviolet, Scanners, Manufacturing, Physics, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics, Phase shifts

SPIE Journal Paper | 6 May 2020
JM3 Vol. 19 Issue 02
KEYWORDS: Diffraction, Photomasks, Phase shifts, Picosecond phenomena, 3D modeling, Extreme ultraviolet, Refractive index, Scanners, Nanoimprint lithography, Tantalum

Showing 5 of 10 publications
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