Dr. Frank J. Timmermans Profile

Dr. Frank J. Timmermans

at ASML

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 26 September 2019

Alternative reticles for low-k1 EUV imaging

M.-Claire van Lare, Frank Timmermans, Jo Finders

Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019

KEYWORDS: Diffraction, Reticles, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Nanoimprint lithography, EUV optics, Phase shifts

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Proceedings Article | 29 August 2019

Alternative mask materials for low-k1 EUV imaging

Frank Timmermans, Claire van Lare, Jo Finders

Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)

KEYWORDS: Diffraction, Reticles, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Phase shifts

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Proceedings Article | 1 May 2019

Experimental investigation of a high-k reticle absorber system for EUV lithography

Jo Finders, Robbert de Kruif, Frank Timmermans, Jara García Santaclara, Brid Connely, Markus Bender, Frank Schurack, Takahiro Onoue, Yohei Ikebe, Dave Farrar

Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X

KEYWORDS: Diffraction, Refractive index, Reticles, Etching, Scanners, Distortion, Photomasks, Extreme ultraviolet lithography, Tantalum, Absorption

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Proceedings Article | 19 September 2018

Alternative absorber materials for mitigation of mask 3D effects in high NA EUV lithography

F. Timmermans, C. van Lare, J. McNamara, E. van Setten, J. Finders

Proc. SPIE. 10775, 34th European Mask and Lithography Conference

KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Computational lithography, Semiconducting wafers, Phase shifts

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