Dr. Frank J. Timmermans
at ASML
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | September 19, 2018
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Computational lithography, Semiconducting wafers, Phase shifts

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