Dr. Frank J. Timmermans
at ASML
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 26 September 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Diffraction, Reticles, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Nanoimprint lithography, EUV optics, Phase shifts

Proceedings Article | 29 August 2019
Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)
KEYWORDS: Diffraction, Reticles, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Phase shifts

Proceedings Article | 1 May 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Diffraction, Refractive index, Reticles, Etching, Scanners, Distortion, Photomasks, Extreme ultraviolet lithography, Tantalum, Absorption

Proceedings Article | 19 September 2018
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Computational lithography, Semiconducting wafers, Phase shifts

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