Dr. Frank J. Timmermans Profile

Dr. Frank J. Timmermans

at ASML Netherlands BV

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 22 February 2021 Presentation

Investigation into a prototype EUV attenuated phase-shift mask

Claire van Lare, Frank Timmermans, Jo Finders, Olena Romanets, Cheuk-Wah Man, Paul van Adrichem, Yohei Ikebe, Takeshi Aizawa, Takahiro Onoue

Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII

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Proceedings Article | 18 December 2020 Presentation + Paper

Multilayer optimization for high-NA EUV mask3D suppression

Eelco van Setten, Katrina Rook, Hazem Mesilhy, Gerardo Bottiglieri, Frank Timmermans, Meng Lee, Andreas Erdmann, Tim Brunner

Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020

KEYWORDS: Scanners, Manufacturing, Reflectivity, Ion beams, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics

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SPIE Journal Paper | 1 October 2020

Perspectives and tradeoffs of absorber materials for high NA EUV lithography

Andreas Erdmann, Hazem Mesilhy, Peter Evanschitzky, Vicky Philipsen, Frank Timmermans, Markus Bauer

JM3 Vol. 19 Issue 04

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Proceedings Article | 20 September 2020 Presentation

EUV phase shift mask requirements for imaging at low-k1

Frank Timmermans, Claire van Lare, Jo Finders, Robert de Kruif

Proc. SPIE. 11518, Photomask Technology 2020

KEYWORDS: Reticles, Deep ultraviolet, Scanners, Manufacturing, Physics, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics, Phase shifts

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SPIE Journal Paper | 6 May 2020

Mask-absorber optimization: the next phase

Claire van Lare, Frank Timmermans, Jo Finders

JM3 Vol. 19 Issue 02

KEYWORDS: Diffraction, Photomasks, Phase shifts, Picosecond phenomena, 3D modeling, Extreme ultraviolet, Refractive index, Scanners, Nanoimprint lithography, Tantalum

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Proceedings Article | 24 March 2020 Presentation

Perspectives and tradeoffs of novel absorber materials for high NA EUV lithography (Conference Presentation)

Andreas Erdmann, Hazem Mesilhy, Peter Evanschitzky, Vicky Philipsen, Frank Timmermans, Markus Bauer

Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI

KEYWORDS: Lithography, Refractive index, Lithographic illumination, Imaging systems, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Tantalum

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Proceedings Article | 26 September 2019 Presentation + Paper

Alternative reticles for low-k1 EUV imaging

M.-Claire van Lare, Frank Timmermans, Jo Finders

Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019

KEYWORDS: Diffraction, Reticles, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Nanoimprint lithography, EUV optics, Phase shifts

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