Frank van de Mast
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Diffraction, Metrology, Polarization, Optical properties, Image processing, Inspection, Physics, Computer simulations, Process control, Detection theory, Semiconducting wafers, Overlay metrology, Diffraction gratings, Accuracy assessment

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Metrology, Sensors, Scanners, Control systems, Time metrology, Neural networks, Machine learning, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 13, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Reticles, Metrology, Optical lithography, Interferometers, Sensors, Calibration, Computer programming, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Refractive index, Reticles, Metrology, Interferometers, Computer programming, Time metrology, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | June 26, 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Reticles, Imaging systems, Control systems, Distortion, Photomasks, Critical dimension metrology, Semiconducting wafers, Optics manufacturing, Binary data, Phase shifts

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