Prof. Albert M. Brouwer
Professor at ARCNL
SPIE Involvement:
Author
Publications (6)

SPIE Journal Paper | May 10, 2018
JM3 Vol. 17 Issue 02
KEYWORDS: Absorption, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Tin, Zirconium, Metals, Lithography, Oxides, Chemical elements

SPIE Journal Paper | September 15, 2017
JM3 Vol. 16 Issue 03
KEYWORDS: Optical lithography, Extreme ultraviolet, Tin, Extreme ultraviolet lithography, Photoresist materials, Lithography, Absorption, Silicon, Molecules, Chemical species

SPIE Journal Paper | June 22, 2017
JM3 Vol. 16 Issue 02
KEYWORDS: Deep ultraviolet, Hard x-rays, Photoemission spectroscopy, Photoresist materials, Extreme ultraviolet lithography, Oxidation, Chemical species, Extreme ultraviolet, Absorption, 3D modeling

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Deep ultraviolet, Chemical species, Spectroscopy, Molecules, Electrons, Oxygen, Photoresist materials, Extreme ultraviolet lithography, Chemical reactions, Photoemission spectroscopy, Photochemistry, Hard x-rays, Tin, Oxidation

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Thin films, Lithography, Optical lithography, Spectroscopy, Silicon, Infrared spectroscopy, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Stochastic processes, Tin, Absorption

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Oxides, Lithography, Light sources, Polymethylmethacrylate, Polymers, Metals, Quantum efficiency, Photoresist materials, Transmittance, Extreme ultraviolet, Chemical analysis, Extreme ultraviolet lithography, Zirconium, Tin, Absorption, Chemically amplified resists

Showing 5 of 6 publications
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