Dr. Fred Lo
manager at Nexchip Semiconductor Corp
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 20 March 2018 Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Data modeling, Calibration, Image segmentation, 3D modeling, Feature extraction, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 13 March 2018 Paper
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Lithography, Metrology, Image processing, Image acquisition, Feature extraction, Scanning electron microscopy, Finite element methods, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 15 March 2016 Paper
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Optical lithography, Data modeling, Calibration, Image processing, Remote sensing, Materials processing, SRAF, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Process modeling

Proceedings Article | 31 March 2014 Paper
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Optical lithography, Detection and tracking algorithms, Calibration, Error analysis, Printing, Photomasks, Optical proximity correction, Critical dimension metrology, Tolerancing

Proceedings Article | 12 April 2013 Paper
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Data modeling, Calibration, Metals, Inspection, Finite element methods, Photomasks, Optical proximity correction, Critical dimension metrology, Tolerancing

Showing 5 of 9 publications
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