Dr. Frederik Blumrich
Innovation Manager at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Area of Expertise:
EUV mask technology , EUV mask defectivity , EUV defect mitigation , Optical metrology , Particle Image Velocimetry , Close-range photogrammetry
Websites:
Profile Summary

Reviewer for Optical Engineering since 2012
Publications (2)

SPIE Journal Paper | October 27, 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Scanners, Extreme ultraviolet lithography, Scanning electron microscopy, Lithography, Deep ultraviolet, Atomic force microscopy, Manufacturing

SPIE Journal Paper | June 1, 2010
OE Vol. 49 Issue 06
KEYWORDS: Error analysis, Detection and tracking algorithms, Optical testing, Optical engineering, Reconstruction algorithms, Particles, Digital image correlation, Computer simulations, Algorithm development, Image analysis

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top