How accurately can you determine positions using a non-expensive imaging system? We demonstrate a system, that has the potential to achieve position detections over a large measurement field (200 x 200 mm) for one million times one million 2D positions. Non-expensive telecentric imaging of the large object field is achieved using a large diffractive front element in combination with two small off-the-shelf lenses. The position measurement itself is considerably improved using a simple replication technique: the point to be measured is replicated N-times and the centers of gravity of the N points are averaged. By this approach discretization errors and camera noise are reduced by the square root of the number of points. We describe the system, discuss the error model and show experimental results for the DOE-based telecentric imaging and the position detection sensing.
Diffractive optical elements offer a high degree of freedom for controlling phase and spectral behavior in optical designs. This enables new and compact optical sensors and measurement systems. We show several recent applications which bene t from unique properties of diffractive optical elements. The applications include: field aberration correction e.g. for microscopic projection applications through microscope objective lenses, a 200 channel microscope objective integrated optical addressing system, diffractive/refractive hybrid optics for high efficiency beam shaping and deflection angle enlargement of spatial light modulators.
We present a device for tunable spatial polarization shaping, based on a red light photo-addressable cell. Such a cell compartment is based on a bisazobenzene containing photoaligning layer and a rubbed PI aligning and is filled with the LC mixture E5. Switchable spatial addressing patterns are generated by a 200 channel micro optical addressing unit based on a red VCSEL array (λ = 650 nm) and diffractive beam shapers.
Microoptical components play an increasing role in different technology fields such as medical engineering, materials
and information processing, imaging and metrology. But their realization needs the combination of modern design
concepts with sophisticated processing technologies, new materials and design tools. Furthermore, the introduction of
ambitious processing technologies must be accompanied by effective metrology and inspection tools. Therefore, this
paper reports about the technologies for making microoptics at ITO. Because sophisticated measurement tools are an
indispensable part of the fabrication process, the paper describes our multi-scale inspection approach for the testing of
microstructures on wafer-scale level. Finally, some representative applications of microoptical components for advanced
measurement and imaging are explained.
We investigate the possibility to produce photochromic CGHs with maskless lithography methods. For this
purpose, optical properties and requirements of photochromic materials will be shown. A diarylethene-based
polyurethane is developed and characterized. The resolution limit and the in
uence of the writing parameters
on the produced patterns, namely speed rate and light power, have been determined. After the optimization of
the writing process, gratings and Fresnel Zone Plates are produced on the photochromic layer and diraction
eciencies are measured. Improvements and perspectives will be discussed.