Dr. Freimut Reuther
at micro resist technology GmbH
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | May 2, 2008
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Lithography, Transparency, Quartz, Polymers, Glasses, Ultraviolet radiation, Silicon, Coating, Sol-gels, Nanoimprint lithography

PROCEEDINGS ARTICLE | March 22, 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Lithography, Etching, Polymers, Ultraviolet radiation, Coating, Resistance, Epoxies, Nanoimprint lithography, Semiconducting wafers, Temperature metrology

PROCEEDINGS ARTICLE | March 15, 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Lithography, Polymers, Glasses, Ultraviolet radiation, Annealing, Polymerization, Epoxies, Nanoimprint lithography, Photoresist processing, Temperature metrology

PROCEEDINGS ARTICLE | May 6, 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Polymethylmethacrylate, Polymers, Glasses, Annealing, Distortion, Solids, Polymerization, Nanoimprint lithography, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | May 20, 2004
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Lithography, Polymethylmethacrylate, Dry etching, Polymers, Glasses, Molecules, Silicon, Scanning electron microscopy, Temperature metrology, Plasma

PROCEEDINGS ARTICLE | June 16, 2003
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Polymethylmethacrylate, Etching, Polymers, Glasses, Resistance, Polymerization, Epoxies, Plasma etching, Nanoimprint lithography, Temperature metrology

Showing 5 of 10 publications
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