Dr. Friso Wittebrood
SPIE Involvement:
Publications (15)

Proceedings Article | 10 April 2024 Presentation + Paper
Victor Calado, Simon Mathijssen, Eelco van Setten, Jo Finders, Friso Wittebrood, Wim Bouman, Kaustuve Bhattacharyya, Willem op 't Root, Elliott McNamara, Matthew McLaren
Proceedings Volume 12953, 1295307 (2024) https://doi.org/10.1117/12.3010835
KEYWORDS: Semiconducting wafers, Personal protective equipment, Metrology, Logic, Scanning electron microscopy, Metals, Extreme ultraviolet lithography, Optical testing, Matrices, Image classification

Proceedings Article | 21 November 2023 Presentation + Paper
Proceedings Volume 12750, 1275002 (2023) https://doi.org/10.1117/12.2687703
KEYWORDS: Critical dimension metrology, Zoom lenses, Reticles, Metrology, Image quality, Extreme ultraviolet, Stochastic processes, Statistical analysis, Semiconducting wafers, Overlay metrology

Proceedings Article | 28 September 2021 Presentation
Proceedings Volume 11854, 118540G (2021) https://doi.org/10.1117/12.2600965
KEYWORDS: Imaging systems, Extreme ultraviolet, Fiber optic illuminators, Transistors, Scanners, Optimization (mathematics), Mirrors, Metals, Extreme ultraviolet lithography

Proceedings Article | 3 October 2018 Presentation + Paper
Proceedings Volume 10809, 1080905 (2018) https://doi.org/10.1117/12.2503343
KEYWORDS: Metals, Optical lithography, Extreme ultraviolet lithography, Logic, Photomasks, Scanners, Double patterning technology, High volume manufacturing, Source mask optimization, Semiconducting wafers

Proceedings Article | 28 September 2017 Paper
Bartosz Bilski, Ziyang Wang, Friso Wittebrood, John McNamara, Dorothe Oorschot, Mark van de Kerkhof, Timon Fliervoet
Proceedings Volume 10446, 1044605 (2017) https://doi.org/10.1117/12.2280379
KEYWORDS: Scanners, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers, Photomasks, Extreme ultraviolet, Diffraction, Semiconductors, Overlay metrology, Lithographic illumination, Image contrast enhancement

Showing 5 of 15 publications
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