Friso Wittebrood
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Publications (12)

PROCEEDINGS ARTICLE | October 3, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Logic, Optical lithography, Metals, Scanners, Photomasks, Extreme ultraviolet lithography, Double patterning technology, Source mask optimization, High volume manufacturing, Semiconducting wafers

PROCEEDINGS ARTICLE | September 28, 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Semiconductors, Diffraction, Lithographic illumination, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Image contrast enhancement, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Diffraction, Logic, Lithographic illumination, Image acquisition, Photomasks, Image enhancement, Extreme ultraviolet lithography, Source mask optimization, SRAF, Critical dimension metrology, 3D image processing

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Metals, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, Critical dimension metrology, Semiconducting wafers, Stochastic processes, System on a chip, Back end of line

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Logic, Optical lithography, Etching, Metals, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Tin, Back end of line

PROCEEDINGS ARTICLE | April 26, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Lithographic illumination, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Immersion lithography, Nanoimprint lithography, Critical dimension metrology, Neodymium, Tantalum, Semiconducting wafers

Showing 5 of 12 publications
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