Fritjof Hempel
Product Quality Engineer at Olympus Winter & Ibe GmbH
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Metrology, Switches, Scanners, Error analysis, Manufacturing, Extreme ultraviolet lithography, Feedback loops, Semiconducting wafers, Overlay metrology, Nonlinear control

Proceedings Article | 4 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Reticles, Metrology, Data modeling, Scanners, Error analysis, Image registration, Pellicles, Photomasks, Semiconducting wafers, Overlay metrology

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