Fu-Jye Liang
at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 27 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Superposition, Microfluidics, Scanners, Particles, Digital watermarking, Computer simulations, Printing, System identification, Immersion lithography, Semiconducting wafers

Proceedings Article | 26 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Wafer-level optics, Polymers, Particles, Digital watermarking, Scanning electron microscopy, Printing, Immersion lithography, Neodymium, Semiconducting wafers, Defect inspection

SPIE Journal Paper | 1 January 2007
JM3 Vol. 6 Issue 01
KEYWORDS: Semiconducting wafers, Particles, Immersion lithography, Printing, Scanners, Double patterning technology, Liquids, Digital watermarking, Wafer testing, Reticles

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Phase shifting, Optical lithography, Etching, Quartz, Photomasks, Mask making, Semiconducting wafers, Photomask technology, Phase shifts

SPIE Journal Paper | 1 October 2002
JM3 Vol. 1 Issue 03
KEYWORDS: Diffraction, Printing, Photomasks, Phase shifts, Lithographic illumination, Visualization, Monochromatic aberrations, Lithography, Optical lithography, Resolution enhancement technologies

Proceedings Article | 14 September 2001
Proc. SPIE. 4346, Optical Microlithography XIV
KEYWORDS: Lithography, Diffraction, Monochromatic aberrations, Optical lithography, Lithographic illumination, Electroluminescence, Printing, Photomasks, Critical dimension metrology, Phase shifts

Showing 5 of 9 publications
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