Mr. Fu-Sheng Chu Profile

Fu-Sheng Chu

at Rexchip Electronics Corp

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Publications (2)

Proceedings Article | 4 December 2008 Paper

Analysis of adsorption effect of absorbent and threshold limit value (TLV) of Q-time for 193nm ArF reticle haze resistance

Fu-Sheng Chu, Shean-Hwan Chiou

Proceedings Volume 7140, 71403F (2008) https://doi.org/10.1117/12.803784

KEYWORDS: Air contamination, Photomasks, Reticles, Resistance, Semiconducting wafers, Adsorption, Binary data, Ions, Chemical analysis, Optical lithography

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Proceedings Article | 19 May 2008 Paper

A study of high peroxynitrite generated in purge head outlet of charger with continuous supply of superior purification CDA system for 193 nm ArF reticle haze prevention

Fu-Sheng Chu, Shean-Hwan Chiou

Proceedings Volume 7028, 70282E (2008) https://doi.org/10.1117/12.799404

KEYWORDS: Ions, Head, Chemical analysis, Air contamination, Reticles, Photomasks, Polymers, Contamination, Infrared radiation, Oxygen

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In this study, A phenomenon of high peroxynitrite generated in purge gas in purge head outlet of RSP SMIF-POD Charger was found. A superior purification CDA("CDA" is abbreviated from Clean Dry Air) continuous purge system has been used in 193nm ArF reticle chemical free preservation process for mask Haze control. Ion Chromatography(IC) and Gas Chromatography Mass Spectrometry(thermal desorber GC-MS) methods are used to analyze and verify inorganic ion and volatility organic compound cleanliness of purge gas, respectively. After IC analysis, high nitrate ion concentration was detected in UPW("UPW" is abbreviated from Ultra-Purification Water). As a result of this study, It is confident of presuming that high peroxynitrite contamination in purge gas in purge head outlet was caused by the blow type in-line gas ionizer, high potential(approximate 2KV) needle discharge influence on the inside of purge piping of Charger. After bypass in-line gas ionizer apparatus, the IC analysis result has a tendency towards a diminution in peroxynitrite that nitrate ion was not detected in UPW at all. At the same operation condition, if purge gas replace by superior purification AN₂(A Class Nitrogen) and the inference conjectured that high ammonium ion response in UPW would take place. According to our study, superior purification CDA passed through the emitter tip of blow type in-line gas ionizers and under high potential needle discharge influence, high peroxynitrite concentration was generated in purge gas in purge head outlet of Charger. Due to the generation of peroxynitrite ion contamination in purge gas, it was not suitable to apply in the prevention of ESD damage of mask pattern in superior purification CDA(Clean Dry Air) continuous purge system. In this study, we also unexpectedly find that the blow type in-line gas ionizer with thermoplastic conductive tube resulted in purge gas a large number of volatility organic compounds(VOCs) contamination. VOC outgassing was generated from the inner walls of conductive tube which the most neighbor on the emitter tip, and heated by the power dissipation of needle discharge influence of corona ionizers.

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