Fumiharu Nakajima
at Toshiba Corp
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Wafer-level optics, Lithography, Calibration, Computer simulations, Feature extraction, Photomasks, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | March 26, 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Semiconductors, Lithography, Optical lithography, Metals, Image processing, Manufacturing, Photomasks, Double patterning technology, Semiconducting wafers, Standards development

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9053, Design-Process-Technology Co-optimization for Manufacturability VIII
KEYWORDS: Semiconductors, Lithography, Logic, Optical lithography, Metals, Manufacturing, Microelectronics, Photomasks, Double patterning technology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8684, Design for Manufacturability through Design-Process Integration VII
KEYWORDS: Lithography, Optical lithography, Metals, Image processing, Manufacturing, Optical resolution, Photomasks, Double patterning technology, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | May 26, 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Lithography, Optical lithography, Etching, Design for manufacturing, Photomasks, Optical proximity correction, Deposition processes, Critical dimension metrology, Semiconducting wafers, Design for manufacturability

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Optical lithography, Data modeling, Aerospace engineering, Etching, Data acquisition, Neural networks, Photomasks, Cadmium sulfide, Personal protective equipment

Showing 5 of 8 publications
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