Fumihiro Koba
Researcher at SELETE
SPIE Involvement:
Publications (8)

Proceedings Article | 2 April 2007 Paper
E. Soda, F. Koba, S. Kondo, S. Ogawa, S. Saito
Proceedings Volume 6519, 65192P (2007) https://doi.org/10.1117/12.710788
KEYWORDS: Etching, Refractive index, Critical dimension metrology, FT-IR spectroscopy, Silicon, Scanning electron microscopy, Semiconducting wafers, Optical properties, Polymers, Electron beam lithography

Proceedings Article | 24 March 2006 Paper
Proceedings Volume 6151, 615127 (2006) https://doi.org/10.1117/12.655976
KEYWORDS: Photoresist processing, Failure analysis, Etching, Back end of line, Semiconducting wafers, Critical dimension metrology, Electron beam lithography, Lithography, Extreme ultraviolet lithography, Photomasks

Proceedings Article | 23 March 2006 Paper
Proceedings Volume 6151, 61511F (2006) https://doi.org/10.1117/12.655425
KEYWORDS: Photomasks, Reactive ion etching, Etching, Semiconducting wafers, Scattering, Mask making, Electron beam lithography, Silicon, Image resolution, Optical lithography

Proceedings Article | 6 May 2005 Paper
F. Koba, T. Tsuchida, H. Sakaue, K. Koike, J. Yamamoto, N. Iriki, H. Yamashita, S. Kageyama, T. Nasuno, E. Soda, K. Takeda, H. Kobayashi, F. Shoji, H. Okamura, Y. Matsubara, H. Arimoto
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599257
KEYWORDS: Metals, Transmission electron microscopy, Lithography, Scanners, Copper, Scanning electron microscopy, Resistance, Electron beam lithography, Overlay metrology, Chemical mechanical planarization

Proceedings Article | 20 May 2004 Paper
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534875
KEYWORDS: Metals, Resistance, Overlay metrology, Lithography, Photomasks, Distortion, Copper, Photography, Electron beam lithography, Optical lithography

Showing 5 of 8 publications
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