Fumiko Ota
at HOYA Corp
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 9 November 2005 Paper
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Particles, Photomasks, Data storage, Contamination, Optical properties, Inspection, Polymethylmethacrylate, Adhesives, Air contamination

Proceedings Article | 28 August 2003 Paper
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Reflectivity, Coating, Deep ultraviolet, Reticles, Critical dimension metrology, Line edge roughness, Tolerancing, Laser systems engineering, Optical lithography, Laser applications

Proceedings Article | 1 August 2002 Paper
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Coating, Reticles, Photoresist processing, Scanning electron microscopy, Critical dimension metrology, Compact discs, Opacity, Photomasks, Image resolution, Standards development

Proceedings Article | 11 March 2002 Paper
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Compact discs, Reticles, Particle contamination, Packaging, Photomasks, Standards development, Photomask technology, Chemically amplified resists, Ions, Coating

Proceedings Article | 5 September 2001 Paper
Proc. SPIE. 4409, Photomask and Next-Generation Lithography Mask Technology VIII
KEYWORDS: Packaging, Compact discs, Resolution enhancement technologies, Coating, Humidity, Reticles, Optical isolators, Particle contamination, Scanning electron microscopy, Photomasks

Showing 5 of 8 publications
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