Fumiko Ota
at HOYA Corp
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 9 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Contamination, Polymethylmethacrylate, Optical properties, Data storage, Air contamination, Particles, Inspection, Photomasks, Adhesives

Proceedings Article | 28 August 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Reticles, Optical lithography, Deep ultraviolet, Coating, Laser applications, Reflectivity, Critical dimension metrology, Line edge roughness, Tolerancing, Laser systems engineering

Proceedings Article | 1 August 2002
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Reticles, Opacity, Coating, Image resolution, Scanning electron microscopy, Photomasks, Compact discs, Critical dimension metrology, Photoresist processing, Standards development

Proceedings Article | 11 March 2002
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Packaging, Reticles, Ions, Coating, Photomasks, Compact discs, Particle contamination, Photomask technology, Standards development, Chemically amplified resists

Proceedings Article | 5 September 2001
Proc. SPIE. 4409, Photomask and Next-Generation Lithography Mask Technology VIII
KEYWORDS: Packaging, Reticles, Coating, Scanning electron microscopy, Humidity, Photomasks, Compact discs, Optical isolators, Particle contamination, Resolution enhancement technologies

Showing 5 of 8 publications
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