Fuminori Hayano
Assistant Department Manager at Nikon Corp
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Wafer-level optics, Semiconductors, Polarization, Birefringence, Reflectivity, Photoresist materials, Objectives, Critical dimension metrology, Astronomical imaging, Semiconducting wafers

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Wafer-level optics, Confocal microscopy, Cameras, Image processing, Diffusion, Inspection, Profiling, Data conversion, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | March 23, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Wafer-level optics, Diffraction, Polarization, Birefringence, Inspection, Optical simulations, Critical dimension metrology, Semiconducting wafers, Wafer testing

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