Fuminori Hayano
Assistant Department Manager at Nikon Corp
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 2 April 2010 Paper
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Wafer-level optics, Semiconductors, Polarization, Birefringence, Reflectivity, Photoresist materials, Objectives, Critical dimension metrology, Astronomical imaging, Semiconducting wafers

Proceedings Article | 2 April 2010 Paper
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Wafer-level optics, Confocal microscopy, Cameras, Image processing, Diffusion, Inspection, Profiling, Data conversion, Semiconducting wafers, Defect inspection

Proceedings Article | 23 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Wafer-level optics, Diffraction, Polarization, Birefringence, Inspection, Optical simulations, Critical dimension metrology, Semiconducting wafers, Wafer testing

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