Fumio Aramaki
Chief Engineer at Hitachi High-Tech Science Corp
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 21 October 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Etching, Quartz, Ions, Nitrogen, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers, Phase shifts

Proceedings Article | 2 July 2013
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Sensors, Etching, Image processing, Ions, Laser applications, Optical testing, Photomasks, Raster graphics, Tantalum, Barium

Proceedings Article | 30 June 2012
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Etching, Quartz, Ions, Image resolution, Atomic force microscopy, Scanning electron microscopy, Ion beams, Photomasks, Extreme ultraviolet, Critical dimension metrology

Proceedings Article | 7 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Mirrors, Etching, Ions, Silicon, Reflectivity, Image resolution, Ion beams, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium

Proceedings Article | 25 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Carbon, Etching, Image processing, Ions, Scanning electron microscopy, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Cadmium sulfide, Semiconducting wafers

Showing 5 of 11 publications
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