Dr. Fumio Murai
at JSTA
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 20 August 2004 Paper
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Scattering, Silicon, Monte Carlo methods, Software development, Photomasks, Optical proximity correction, Analytical research, Critical dimension metrology, Semiconducting wafers, Projection lithography

Proceedings Article | 28 August 2003 Paper
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Monochromatic aberrations, Electron beams, Backscatter, Data processing, Image classification, Double patterning technology, Optical aberrations, Data corrections, Projection lithography

Proceedings Article | 1 August 2002 Paper
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Lithography, Electron beams, Scattering, Metals, Reliability, Photomasks, Analytical research, Semiconducting wafers, Electronic design automation, Projection lithography

Proceedings Article | 1 July 2002 Paper
Proc. SPIE. 4688, Emerging Lithographic Technologies VI
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Distortion, Photomasks, Optical simulations, Photoresist processing, Semiconducting wafers, Projection lithography, Chemically amplified resists

Proceedings Article | 11 March 2002 Paper
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Visualization, Scattering, Reliability, Photomasks, Analytical research, Semiconducting wafers, Projection lithography

Showing 5 of 9 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top