Dr. Fumio Murai Profile

Dr. Fumio Murai

at JSTA

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Author

Publications (9)

Proceedings Article | 20 August 2004 Paper

Proximity-effect correction software for EPL using the pattern classify method

Shigeki Mori, Akio Sato, Kyoji Nakajo, Masanori Shoji, Naomi Shimada, Hirokazu Sambayashi, Kenzo Goto, Fumio Murai, Hiroshi Fukuda

Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI

KEYWORDS: Scattering, Silicon, Monte Carlo methods, Software development, Photomasks, Optical proximity correction, Analytical research, Critical dimension metrology, Semiconducting wafers, Projection lithography

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Proceedings Article | 28 August 2003 Paper

Proximity-effect correction for EPL by using multiple pattern-area-density maps and pattern classification

Fumio Murai, Hiroshi Fukuda, Shigeki Mori, Akio Sato, Kyoji Nakajo

Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X

KEYWORDS: Lithography, Monochromatic aberrations, Electron beams, Backscatter, Data processing, Image classification, Double patterning technology, Optical aberrations, Data corrections, Projection lithography

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Proceedings Article | 1 August 2002 Paper

Method for generating complementary mask data for an EPL stencil mask using a commercial pattern operation tool

Akemi Moniwa, Fumio Murai

Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX

KEYWORDS: Lithography, Electron beams, Scattering, Metals, Reliability, Photomasks, Analytical research, Semiconducting wafers, Electronic design automation, Projection lithography

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Proceedings Article | 1 July 2002 Paper

Experimental investigation of the Coulomb effect in electron projection lithography (EPL)

Jiro Yamamoto, Fumio Murai, Akemi Moniwa

Proc. SPIE. 4688, Emerging Lithographic Technologies VI

KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Distortion, Photomasks, Optical simulations, Photoresist processing, Semiconducting wafers, Projection lithography, Chemically amplified resists

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Proceedings Article | 11 March 2002 Paper

Practical complementary mask-data generation for EPL stencil masks using general geometrical operation tools

Akemi Moniwa, Fumio Murai

Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology

KEYWORDS: Lithography, Electron beam lithography, Electron beams, Visualization, Scattering, Reliability, Photomasks, Analytical research, Semiconducting wafers, Projection lithography

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Proceedings Article | 14 June 1996 Paper

Contrast-boosted resist using a polarity-change reaction during aqueous base development

Shou-ichi Uchino, Takumi Ueno, Sonoko Migitaka, Jiro Yamamoto, Toshihiko Tanaka, Fumio Murai, Hiroshi Shiraishi, Michiaki Hashimoto

Proc. SPIE. 2724, Advances in Resist Technology and Processing XIII

KEYWORDS: Lithography, Optical lithography, Ultraviolet radiation, Diffusion, Photography, Scanning electron microscopy, Photomasks, Analytical research, Industrial chemicals, Absorption

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Proceedings Article | 5 April 1995 Paper

New optical waveguide structure: a trench-channel-type high-density waveguide in Si

Tohru Nakamura, Takeshi Kato, Tomonori Tanoue, Fumio Murai, Mitsuo Takeda

Proc. SPIE. 2400, Optoelectronic Interconnects III

KEYWORDS: Channel waveguides, Waveguides, Silicon, Resistance, Capacitance, Neural networks, Integrated circuits, Photonic integrated circuits, Logic devices, Optical interconnects

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Proceedings Article | 1 August 1991 Paper

Multiple scattered electron-beam effect in electron-beam lithography

Norio Saitou, Teruo Iwasaki, Fumio Murai

Proc. SPIE. 1465, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing

KEYWORDS: Wafer-level optics, Carbon, Lithography, Polymethylmethacrylate, Scattering, Copper, Silicon, Quantitative analysis, Multiple scattering, Semiconducting wafers

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Proceedings Article | 1 October 1990 Paper

Study of Si-coupled superconducting FETs using microfabrication technologies

Mutsuko Hatano, Toshikazu Nishino, Haruhiro Hasegawa, Fumio Murai, Tokuo Kure, Hideaki Nakane

Proc. SPIE. 1287, High Tc Superconductivity: Thin Films and Applications

KEYWORDS: Semiconductors, Reflection, Interfaces, Silicon, Resistance, Superconductors, Aluminum, Boron, Niobium, Superconductivity

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Showing 5 of 9 publications

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