Fusheng Zhu
at Central Semiconductor Manufacturing Corporation
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 18 December 2019 Paper
Proc. SPIE. 11337, AOPC 2019: Optical Spectroscopy and Imaging
KEYWORDS: Lithography, Manufacturing, Numerical simulations, Far-field diffraction, Photomasks, Nanoimprint lithography, Critical dimension metrology, Fourier optics, Semiconducting wafers

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