G. William Banke
SPIE Involvement:
Author | Instructor
Publications (20)

SPIE Journal Paper | 27 February 2012
JM3 Vol. 11 Issue 1
KEYWORDS: Metrology, Atomic force microscopy, Nanotechnology, Critical dimension metrology, Transmission electron microscopy, Scanning electron microscopy, Semiconductors, Silicon, Coating, Silicon carbide

Proceedings Article | 24 August 2010 Paper
Proc. SPIE. 7767, Instrumentation, Metrology, and Standards for Nanomanufacturing IV
KEYWORDS: Semiconductors, Nanotechnology, Metrology, Silicon, Coating, Atomic force microscopy, Scanning electron microscopy, Transmission electron microscopy, Silicon carbide, Critical dimension metrology

Proceedings Article | 24 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Metrology, Calibration, Manufacturing, Atomic force microscopy, Scatterometry, Time metrology, Process control, Semiconducting wafers, Overlay metrology

Proceedings Article | 23 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Lithography, Metrology, Optical lithography, Data modeling, Calibration, Scanners, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 16 April 2008 Paper
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Metrology, Statistical analysis, Calibration, Etching, Scanning electron microscopy, Scatterometry, Process control, Critical dimension metrology, Semiconducting wafers, Multiphoton fluorescence microscopy

Showing 5 of 20 publications
Course Instructor
SC705: Instruments and Methodologies for Accurate Metrology and Fleet Matching
This course teaches the methodologies of total measurement uncertainty (TMU) analysis and fleet measurement precision (FMP) analysis. The course concentrates on the application of a general form of regression analysis (Mandel) to the applications of measurement tool matching, and measurement instrument assessment and optimization. Case studies will be selected from a collection of examples from measurement technologies such as CD-SEM, scatterometer, overlay, and CD-AFM. These examples will provide the seminar participants with the knowledge and tools necessary for conducting single tool and multiple tool assessments and optimizations.
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