Dr. Gregory A. Rechtsteiner
at ASML
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 20 March 2018 Presentation + Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Temporal coherence, Lithography, Light sources, Metrology, Optical lithography, Etching, Line width roughness, Line edge roughness, Semiconducting wafers

Proceedings Article | 1 May 2017 Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Semiconductors, Light sources, Optical lithography, Deep ultraviolet, Modulation, Scanners, Inspection, Immersion lithography, Image contrast enhancement, Semiconducting wafers

Proceedings Article | 30 March 2017 Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Light sources, Optical lithography, Data modeling, Deep ultraviolet, Scanners, Process control, Photomasks, Excimer lasers, Beam shaping, Immersion lithography, Optical proximity correction, Critical dimension metrology

Proceedings Article | 30 March 2017 Presentation + Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Semiconductors, Lithography, Light sources, Metrology, Optical lithography, Deep ultraviolet, Manufacturing, Photomasks, Semiconductor manufacturing, Double patterning technology, Immersion lithography, Source mask optimization, Optical proximity correction, Image contrast enhancement, Semiconducting wafers

Proceedings Article | 30 March 2017 Presentation + Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Light sources, Eye, Metrology, Optical lithography, Image processing, Control systems, Electroluminescence, Process control, Source mask optimization, Optical proximity correction, Critical dimension metrology, Overlay metrology

Showing 5 of 13 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top