Dr. Gabi Zeltzer
Research Staff Member at
SPIE Involvement:
Conference Program Committee | Author
Publications (3)

SPIE Journal Paper | August 7, 2012
JM3 Vol. 11 Issue 3
KEYWORDS: Nanoimprint lithography, Chromium, Reactive ion etching, Lithography, Silicon, Double patterning technology, Electron beam lithography, Polymethylmethacrylate, Magnetism, Directed self assembly

PROCEEDINGS ARTICLE | March 21, 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Lithography, Electron beam lithography, Silicon, Magnetism, Chromium, Oxygen, Directed self assembly, Double patterning technology, Nanoimprint lithography, Reactive ion etching

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Oxides, Lithography, Electron beam lithography, Sensors, Etching, Silicon, Magnetism, Scanning electron microscopy, Head, Beam propagation method

Conference Committee Involvement (2)
Nanoengineering: Fabrication, Properties, Optics, and Devices VII
3 August 2010 | San Diego, California, United States
Nanoengineering: Fabrication, Properties, Optics, and Devices VI
4 August 2009 | San Diego, California, United States
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