Dr. Ganesh Sundaram
Product Manager at Nanometrics Inc
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Lithography, Electron beams, Metrology, Cadmium, Atomic force microscopy, Scanning electron microscopy, Precision measurement, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Lithography, Electron beam lithography, Metrology, 3D acquisition, Silicon, Atomic force microscopy, Scanning electron microscopy, 3D metrology, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 10 May 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Electronics, Polymers, Image processing, Image acquisition, Control systems, Monte Carlo methods, Line width roughness, Optical simulations, Line edge roughness, Photoresist processing

Proceedings Article | 10 May 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Metrology, Databases, Silicon, Scanning electron microscopy, Scatterometry, Monte Carlo methods, 3D metrology, Optical simulations, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 24 May 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Metrology, Electrons, Silicon, Scanning electron microscopy, Photoresist materials, Monte Carlo methods, Optical proximity correction, Critical dimension metrology, Line edge roughness, Semiconducting wafers

Showing 5 of 11 publications
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