Dr. Gangadhara Raja Muthinti
Advisory Engineer at IBM
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 2 July 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Copper, Scatterometry, Machine learning

Proceedings Article | 5 September 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Mathematical modeling, Metrology, Data modeling, Scanning electron microscopy, Transmission electron microscopy, Scatterometry, Machine learning, Field effect transistors, Semiconducting wafers, Scatter measurement

Proceedings Article | 19 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Semiconductors, Metrology, Etching, Gallium arsenide, Silicon, Measurement devices, Geometrical optics, X-ray fluorescence spectroscopy, Nanolithography

Proceedings Article | 12 April 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Metrology, Metals, X-rays, Copper, Resistance, Scatterometry, Process control, Machine learning, Semiconducting wafers, Back end of line

Proceedings Article | 31 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Diffractive optical elements, Etching, Germanium, X-ray diffraction, Gallium arsenide, Silicon, Materials processing, Solids, Semiconducting wafers, X-ray fluorescence spectroscopy

Showing 5 of 17 publications
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