Dr. Gary Zhang
Director Strategic Marketing at ASML San Jose
SPIE Involvement:
Conference Program Committee | Author
Publications (22)

Proceedings Article | 10 October 2019
Proc. SPIE. 10961, Optical Microlithography XXXII

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Image processing, Photomasks, Machine learning, Source mask optimization, Computational lithography, Optical proximity correction, SRAF, Model-based design

Proceedings Article | 25 March 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Lithography, Cadmium, Data modeling, Calibration, Computer simulations, 3D modeling, Computational lithography, Optical proximity correction, Photoresist processing, Semiconducting wafers

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Target detection, Metrology, Etching, Scanners, Time metrology, Process control, Target acquisition, Semiconducting wafers, Overlay metrology, Back end of line

Proceedings Article | 18 March 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Scanners, Photomasks, Source mask optimization, Optical proximity correction, Semiconducting wafers, Process modeling

Showing 5 of 22 publications
Conference Committee Involvement (4)
SPIE Lithography Asia - Taiwan
18 November 2009 | Taipei, Taiwan
SPIE Lithography Asia - Taiwan
4 November 2008 | Taipei, Taiwan
Optical Microlithography XX
27 February 2007 | San Jose, California, United States
Optical Microlithography XIX
21 February 2006 | San Jose, California, United States
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