Gary Dabbagh
Staff Applications Engineer at JSR Micro Inc
SPIE Involvement:
Author
Publications (14)

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Polymers, Silicon, Reflectivity, Photoresist materials, Photomasks, Picosecond phenomena, Critical dimension metrology, Semiconducting wafers, Photoresist developing

PROCEEDINGS ARTICLE | March 26, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Semiconductors, Lithography, Particles, Silicon, Scanning electron microscopy, Photomasks, Double patterning technology, Reactive ion etching, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | April 9, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Statistical analysis, Polymers, Scanners, Scanning electron microscopy, Solids, Immersion lithography, Thin film coatings, Photoresist processing, Polymer thin films

PROCEEDINGS ARTICLE | March 23, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Lithographic illumination, Etching, Chemical species, Polymers, Resistance, Photoresist materials, Immersion lithography, Fluorine, 193nm lithography

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Modulation, Etching, Polymers, Photoresist materials, Photomasks, Immersion lithography, Reactive ion etching, Fluorine, 193nm lithography

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Polymers, Image processing, Scanners, Particles, Materials processing, Photoresist materials, Immersion lithography, Photoresist processing, Semiconducting wafers

Showing 5 of 14 publications
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