Gary R. Newman
Key Account Manager at Nikon Precision Inc
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Thin films, Lithography, Reticles, Imaging systems, Error analysis, Manufacturing, Distortion, Head, Semiconducting wafers, Thin film manufacturing

Proceedings Article | 2 June 2000
Proc. SPIE. 3998, Metrology, Inspection, and Process Control for Microlithography XIV
KEYWORDS: Lithography, Reticles, Metrology, Error analysis, Manufacturing, Diagnostics, Distortion, Head, Measurement devices, Semiconducting wafers

Proceedings Article | 30 August 1999
Proc. SPIE. 3874, Micromachining and Microfabrication Process Technology V
KEYWORDS: Microelectromechanical systems, Thin films, Lithography, Optical lithography, Data storage, Manufacturing, Magnetism, Photoresist materials, Head, Chemical elements

Proceedings Article | 14 June 1999
Proc. SPIE. 3677, Metrology, Inspection, and Process Control for Microlithography XIII
KEYWORDS: Thin films, Lithography, Reticles, Cadmium, Coherence (optics), Photography, Scanning electron microscopy, Photoresist materials, Head, Resolution enhancement technologies

Proceedings Article | 7 July 1997
Proc. SPIE. 3050, Metrology, Inspection, and Process Control for Microlithography XI
KEYWORDS: Lithography, Reticles, Data modeling, Opacity, Photoresist materials, 3D metrology, Optical simulations, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Showing 5 of 9 publications
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