Dr. Geert Vandenberghe
Senior Manager at IMEC
SPIE Involvement:
Senior status | Conference Program Committee | Author
Publications (103)

PROCEEDINGS ARTICLE | April 7, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Optical lithography, Etching, Photoresist materials, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Photoresist processing, Semiconducting wafers, Photoresist developing, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Oxides, Metrology, Logic, Statistical analysis, Etching, Germanium, Resistance, Scanning electron microscopy, 3D metrology, Process control, Critical dimension metrology, Algorithm development, Overlay metrology, Standards development, Back end of line, Fin field effect transitor

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Polymers, Metals, Diffusion, Scanning electron microscopy, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Quenching (fluorescence), Absorption, Chemically amplified resists

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Polymers, Image processing, Scanners, Ultraviolet radiation, Extreme ultraviolet, Line width roughness, Image enhancement, Extreme ultraviolet lithography, Picosecond phenomena, Line edge roughness, Stochastic processes, Floods, Chemically amplified resists

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Optical lithography, Contamination, Etching, Metals, Scanners, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Photoresist developing, Absorption

SPIE Journal Paper | November 7, 2016
JM3 Vol. 15 Issue 04
KEYWORDS: Directed self assembly, Optical lithography, Metals, Photomasks, Lithography, Algorithm development, Immersion lithography, Molecular self-assembly, Electronic design automation, Extreme ultraviolet

Showing 5 of 103 publications
Conference Committee Involvement (18)
Optical Microlithography XXXI
27 February 2018 | San Jose, California, United States
Optical Microlithography XXX
28 February 2017 | San Jose, California, United States
Optical Microlithography XXIX
23 February 2016 | San Jose, California, United States
Optical Microlithography XXVIII
24 February 2015 | San Jose, California, United States
Optical Microlithography XXVII
25 February 2014 | San Jose, California, United States
Showing 5 of 18 published special sections
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