Dr. Geert Vandenberghe
VP Patterning Programs at imec
SPIE Involvement:
Conference Program Committee | Author
Websites:
Publications (133)

Proceedings Article | 9 April 2024 Presentation + Paper
Proceedings Volume 12957, 129570P (2024) https://doi.org/10.1117/12.3009737
KEYWORDS: Extreme ultraviolet lithography, Lithography, Polymers, Extreme ultraviolet, Film thickness, Etching, Electron beam lithography, Optical lithography, Photoresist materials, Critical dimension metrology

Proceedings Article | 21 November 2023 Poster + Paper
Proceedings Volume 12750, 127500U (2023) https://doi.org/10.1117/12.2686602
KEYWORDS: Extreme ultraviolet lithography, Electron beam lithography, Polymers, Lithography, Stochastic processes, Scanners, Printing, High volume manufacturing, Extreme ultraviolet, Polymer thin films

Proceedings Article | 1 May 2023 Presentation + Paper
Proceedings Volume 12498, 1249807 (2023) https://doi.org/10.1117/12.2657506
KEYWORDS: Extreme ultraviolet lithography, Polymers, Lithography, Extreme ultraviolet, Scanners, Photoresist materials, Compact discs, Coating, Etching, Electron beam lithography

Proceedings Article | 25 May 2022 Presentation + Paper
Proceedings Volume 12055, 120550E (2022) https://doi.org/10.1117/12.2613445
KEYWORDS: Extreme ultraviolet lithography, Polymers, Lithography, Extreme ultraviolet, Electron beam lithography, Etching, Photoresist processing, Optical lithography, Photoresist materials, Photomasks

Proceedings Article | 29 September 2021 Presentation
Akihide Shirotori, Manabu Hoshino, Danilo De Simone, Geert Vandenberghe, Hirokazu Matsumoto
Proceedings Volume 11854, 118540O (2021) https://doi.org/10.1117/12.2600855
KEYWORDS: Extreme ultraviolet lithography, Electron beam lithography, Photoresist materials, Photoresist developing, Stochastic processes, Printing, Polymers, Photoresist processing, Lithography, Extreme ultraviolet