Dr. Gek Soon Chua
Principal Member of Technical Staff at GLOBALFOUNDRIES Singapore
SPIE Involvement:
Author
Area of Expertise:
OPC/RET , mask specification , source mask optimisation , reticle haze management , mask data preparation , mask process correction
Profile Summary

Professional experiences include
1. Experience in Optical Proximity Correction (OPC), Resolution Enhancement Technologies (RET) & Advanced Mask Optimization (EUV Mask Process Correction, E-beam mask shot count reduction, Model-based Mask Data Preparation, Source-Mask Optimization (SMO) & Flexible-Mask Optimization (FMO))
2. Driving solution to optimize interactive factors such as OPC, fracturing method, enabling VSB with MPC & mask shot count optimization at same time
3. Lead cross functional teams for mask-related device yield loss issue, mask specification ownership, evaluation for OPC- and mask-related equipments & software
4. Environment expert on cross-Fab clean room environmental studies

Accolades include
1. Invited speaker at ebeam Initiative at PMJ 2012 for “Proof Point on MB-MDP and Wafer Quality Simulation”
2. Invited speaker at EMLC 2012 for “Optimization of mask shot count using MB-MDP and lithography simulation”
3. Invited speaker at ebeam Initiative at BACUS 2011 for “Optimization of mask shot count using MB-MDP and lithography simulation”
4. Awarded BACUS 2011 Best Poster Award (1st Place) for “Optimization of mask shot count using MB-MDP and lithography simulation”
Publications (25)

Proceedings Article | 17 October 2019 Presentation
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Signal attenuation, Silicon, Inspection, Photonics, Photomasks, Optical proximity correction, Mask making, Silicon photonics, Semiconducting wafers, Data corrections

Proceedings Article | 26 September 2019 Presentation + Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Modeling, Lithography, Optical lithography, Photomasks, Optical proximity correction, Critical dimension metrology, Tolerancing, Model-based design, Process modeling, 193nm lithography

Proceedings Article | 3 October 2018 Paper
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Calibration, Etching, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Mask making, Critical dimension metrology

Proceedings Article | 8 October 2014 Paper
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Lithography, Data modeling, Error analysis, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design, Vestigial sideband modulation

Proceedings Article | 8 October 2014 Paper
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Cadmium, Visualization, Calibration, Etching, Error analysis, Scanning electron microscopy, Photomasks, Critical dimension metrology, Statistical modeling, Vestigial sideband modulation

Showing 5 of 25 publications
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