Dr. Gene E. Parris
at Air Products and Chemicals Inc
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 23, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Optical lithography, Scanners, Electroluminescence, Scanning electron microscopy, Finite element methods, Line width roughness, Immersion lithography, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Refractive index, Microfluidics, Water, Ultraviolet radiation, Photoresist materials, Absorbance, Immersion lithography, Semiconducting wafers, Fluid dynamics, Absorption

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