Dr. Geoffrey W. Burr
Research Associate at IBM Research - Almaden
SPIE Involvement:
Author
Publications (25)

Proceedings Article | 16 August 2019 Presentation
Proceedings Volume 10958, 109580U (2019) https://doi.org/10.1117/12.2515630
KEYWORDS: Analog electronics, Neural networks, Algorithm development, Evolutionary algorithms, Tolerancing, Applied physics, Computer architecture, Structural design, Digital electronics, Lithography

Proceedings Article | 17 May 2011 Paper
Thierry Grosjean, Mathieu Mivelle, Fadi Baida, Geoffrey Burr, Ulrich Fischer
Proceedings Volume 8070, 807005 (2011) https://doi.org/10.1117/12.886983
KEYWORDS: Magnetism, Metals, Antennas, Near field optics, Dielectrics, Electromagnetism, Near field, Interfaces, Metamaterials, Nanoantennas

Proceedings Article | 16 March 2010 Paper
David Melville, Alan Rosenbluth, Kehan Tian, Kafai Lai, Saeed Bagheri, Jaione Tirapu-Azpiroz, Jason Meiring, Scott Halle, Greg McIntyre, Tom Faure, Daniel Corliss, Azalia Krasnoperova, Lei Zhuang, Phil Strenski, Andreas Waechter, Laszlo Ladanyi, Francisco Barahona, Daniele Scarpazza, Jon Lee, Tadanobu Inoue, Masaharu Sakamoto, Hidemasa Muta, Alfred Wagner, Geoffrey Burr, Young Kim, Emily Gallagher, Mike Hibbs, Alexander Tritchkov, Yuri Granik, Moutaz Fakhry, Kostas Adam, Gabriel Berger, Michael Lam, Aasutosh Dave, Nick Cobb
Proceedings Volume 7640, 764006 (2010) https://doi.org/10.1117/12.846716
KEYWORDS: Source mask optimization, Photomasks, Metals, Lithography, Optical proximity correction, Line edge roughness, Resolution enhancement technologies, Diffractive optical elements, Semiconducting wafers, Scanning electron microscopy

Proceedings Article | 30 September 2009 Paper
Proceedings Volume 7488, 74882D (2009) https://doi.org/10.1117/12.833739
KEYWORDS: Photomasks, Polarization, Electromagnetism, Semiconducting wafers, Data modeling, Lithography, Calibration, Diffraction, Optical proximity correction, Binary data

Proceedings Article | 23 March 2009 Paper
John Bruley, Geoffrey Burr, Robert Davis, Philip Flaitz, William Hinsberg, Frances Houle, Dolores Miller, Michael Pike, Jed Rankin, Alfred Wagner, Andrew Watts
Proceedings Volume 7272, 727215 (2009) https://doi.org/10.1117/12.813934
KEYWORDS: Photomasks, Chromium, Semiconducting wafers, Binary data, Manufacturing, Diffusion, Transmission electron microscopy, Roads, Photoresist materials, Oxidation

Showing 5 of 25 publications
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