Dr. Geoffrey W. Burr
Research Associate at IBM Research - Almaden
SPIE Involvement:
Author
Publications (24)

PROCEEDINGS ARTICLE | May 17, 2011
Proc. SPIE. 8070, Metamaterials VI
KEYWORDS: Metamaterials, Nanoantennas, Metals, Dielectrics, Interfaces, Magnetism, Near field, Antennas, Electromagnetism, Near field optics

PROCEEDINGS ARTICLE | March 16, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Diffractive optical elements, Metals, Scanning electron microscopy, Photomasks, Source mask optimization, Optical proximity correction, Line edge roughness, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | September 30, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Diffraction, Data modeling, Polarization, Calibration, Photomasks, Optical proximity correction, Semiconducting wafers, Electromagnetism, Binary data

PROCEEDINGS ARTICLE | March 23, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Roads, Diffusion, Manufacturing, Chromium, Transmission electron microscopy, Photoresist materials, Photomasks, Semiconducting wafers, Binary data, Oxidation

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Photovoltaics, Lithographic illumination, Diffractive optical elements, Polarization, Manufacturing, Printing, Photomasks, Source mask optimization, Semiconducting wafers

PROCEEDINGS ARTICLE | March 20, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Finite-difference time-domain method, Data modeling, Polarization, Calibration, Computer simulations, Photomasks, Optical proximity correction, Electromagnetism, Binary data

Showing 5 of 24 publications
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