Dr. Geoffrey W. Burr
Research Associate at IBM Research - Almaden
SPIE Involvement:
Author
Publications (25)

Proceedings Article | 16 August 2019 Presentation
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Lithography, Neural networks, Structural design, Applied physics, Analog electronics, Algorithm development, Digital electronics, Computer architecture, Tolerancing, Evolutionary algorithms

Proceedings Article | 17 May 2011 Paper
Proc. SPIE. 8070, Metamaterials VI
KEYWORDS: Metamaterials, Nanoantennas, Metals, Dielectrics, Interfaces, Magnetism, Near field, Antennas, Electromagnetism, Near field optics

Proceedings Article | 16 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Diffractive optical elements, Metals, Scanning electron microscopy, Photomasks, Source mask optimization, Optical proximity correction, Line edge roughness, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 30 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Diffraction, Data modeling, Polarization, Calibration, Photomasks, Optical proximity correction, Semiconducting wafers, Electromagnetism, Binary data

Proceedings Article | 23 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Roads, Diffusion, Manufacturing, Chromium, Transmission electron microscopy, Photoresist materials, Photomasks, Semiconducting wafers, Binary data, Oxidation

Showing 5 of 25 publications
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