Geoffrey A. Gaines
at Lawrence Berkeley National Lab
SPIE Involvement:
Author
Publications (21)

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Diffraction, Monochromatic aberrations, Optical design, Sensors, Interferometry, Wavefronts, Multiplexing, Optical alignment, Diffraction gratings, Shearing interferometers

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Monochromatic aberrations, Optical lithography, Image processing, Scanning electron microscopy, Photoresist materials, Projection systems, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 12 October 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Monochromatic aberrations, Data modeling, Error analysis, Interferometry, Wavefronts, Objectives, Optical resolution, Extreme ultraviolet, Projection lithography, Shearing interferometers

Proceedings Article | 3 April 2018
Proc. SPIE. 10570, International Conference on Space Optics — ICSO 1997

Proceedings Article | 3 September 2008
Proc. SPIE. 7071, An Optical Believe It or Not: Key Lessons Learned
KEYWORDS: Observatories, Spectrographs, Visible radiation, Sun, Sensors, Satellites, Spectroscopy, Microchannel plates, Aluminum, Space operations

Proceedings Article | 15 September 2004
Proc. SPIE. 5549, Weather and Environmental Satellites
KEYWORDS: Visible radiation, Solar energy, Data modeling, Sensors, Calibration, Error analysis, Photodiodes, Extreme ultraviolet, Prototyping, Diffraction gratings

Showing 5 of 21 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top