The integration of carbon nanotubes (CNTs) into conventional silicon-technology with potential applications as interconnects, transistors, memory-cells, and sensors is an promising goal. Theoretical and experimental results indicate that CNT-based devices can outperform conventional silicon microelectronics. Concepts for the creation of vertical interconnects and transistors made out of CNTs, which allow a large scale integration, are presented. A vital step for their realization is the synthesis of individual CNTs with controlled diameters at lithographically predefined locations. Employing catalyst mediated Chemical Vapor Deposition (CVD) isolated CNTs have been grown out of holes in silicon dioxide which have been created by optical lithography. This allows the precise placement of individual CNTs on silicon substrates. Furthermore, the diameter of each CNT adjusts to the hole size, which makes it possible to control this important property separately for individual CNTs. In combination with the vertical integration concept those findings constitute a milestone in the parallel manufacture of nanotube-based devices with scalable batch processes.
Conference Committee Involvement (1)
19 May 2003 | Maspalomas, Gran Canaria, Canary Islands, Spain