Dr. Georg Erley
at Qoniac GmbH
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Optical lithography, Contamination, Sensors, Scanners, Data acquisition, Optimization (mathematics), Semiconducting wafers

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Semiconductors, Lithography, Metrology, Etching, Error analysis, Data processing, Machine learning, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Reticles, Roads, Data modeling, Calibration, Distortion, Optical alignment, Neodymium, Semiconducting wafers, HVAC controls, Overlay metrology

Proceedings Article | 8 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Environmental monitoring, Contamination, Databases, Metals, Scanners, Reflectivity, Data processing, High volume manufacturing, Semiconducting wafers, Overlay metrology

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Semiconductors, Coastal modeling, Data modeling, Zernike polynomials, Process control, Semiconducting wafers, Performance modeling, Overlay metrology, Model-based design, Process modeling

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Metrology, Deep ultraviolet, Etching, Manufacturing, Photoresist materials, Photomasks, Semiconductor manufacturing, Semiconducting wafers, 193nm lithography

Showing 5 of 6 publications
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