Dr. Georg Pawlowski
Engineer/Technical Director at Merck Japan
SPIE Involvement:
Author
Publications (39)

Proceedings Article | 27 March 2014 Paper
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Lithography, Optical lithography, Polymers, Photons, Electrons, Printing, Photomasks, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography

Proceedings Article | 27 March 2014 Paper
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Lithography, Image processing, Materials processing, Photoresist materials, Thermal effects, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Floods, Resolution enhancement technologies

Proceedings Article | 29 March 2013 Paper
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Electron beam lithography, Etching, Polymers, Coating, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Absorption

Proceedings Article | 26 March 2013 Paper
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Lithography, Optical lithography, Deep ultraviolet, Image processing, Materials processing, Photoresist processing, Semiconducting wafers, Yield improvement, 193nm lithography, Resolution enhancement technologies

Proceedings Article | 1 April 2009 Paper
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Gold, Polymers, Copper, Silicon, Coating, Chemistry, Fourier transforms, Plating, Photoresist processing, Semiconducting wafers

Showing 5 of 39 publications
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