George E. Bailey
Director, Technical Marketing at Synopsys Inc
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Author
Publications (21)

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Diffraction, Metrology, Cadmium, Scanners, Photomasks, Integrated optics, Integrated circuits, Optical proximity correction, Tolerancing, Fiber optic illuminators

Proceedings Article | 31 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Data modeling, Calibration, Image processing, Printing, Integrated circuits, Optical proximity correction, Geometrical optics, Semiconducting wafers, Process modeling

Proceedings Article | 12 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Metrology, Detection and tracking algorithms, Data modeling, Visualization, Calibration, Databases, Scanning electron microscopy, Optical proximity correction, Semiconducting wafers, Process modeling

Proceedings Article | 28 March 2007
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Metrology, Data modeling, Calibration, Manufacturing, Scanning electron microscopy, Data processing, Optical proximity correction, Critical dimension metrology, Model-based design, Process modeling

Proceedings Article | 28 March 2007
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Optical lithography, Data modeling, Calibration, Image processing, Feature extraction, Scanning electron microscopy, Printing, Optical proximity correction, Photoresist processing, Process modeling

Showing 5 of 21 publications
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