Dr. George G. Barclay
Global Business Director at Rohm and Haas Electronic Materials, LLC
SPIE Involvement:
Author
Publications (30)

Proceedings Article | 29 March 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Lithography, Electron beam lithography, Switches, Scanners, Coating, Photoresist materials, Thin film coatings, Photoresist processing, Semiconducting wafers, Photoresist developing

Proceedings Article | 19 March 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Polymers, Molecules, Photoresist materials, Molecular interactions, Photoresist processing, Semiconducting wafers, Radium, Photoresist developing, Polymer thin films

Proceedings Article | 19 March 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Electron beam lithography, Polymers, Coating, Photoresist materials, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers, Photoresist developing

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Imaging systems, Image processing, Image resolution, Photomasks, Nanoimprint lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Photoresist developing

Proceedings Article | 26 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Optical lithography, Image processing, Coating, Image resolution, Extreme ultraviolet lithography, Double patterning technology, Immersion lithography, Photoresist processing, Semiconducting wafers

Showing 5 of 30 publications
Conference Committee Involvement (9)
Advances in Patterning Materials and Processes XXXI
24 February 2014 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXX
25 February 2013 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXIX
13 February 2012 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXVIII
28 February 2011 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXVII
22 February 2010 | San Jose, California, United States
Showing 5 of 9 Conference Committees
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