Mr. George Lippincott
Principal Engineer at Mentor Graphics Corp
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Optical lithography, Data modeling, Visualization, Metals, Computer programming, Photomasks, Computational lithography, Optical proximity correction, Semiconducting wafers, Model-based design, Resolution enhancement technologies

SPIE Journal Paper | September 11, 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Dysprosium, Photomasks, Immersion lithography, Source mask optimization, Optical proximity correction, Printing, Optical lithography, Visualization, Lens design, Directed self assembly

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Optical lithography, Visualization, Transmission electron microscopy, Printing, Photomasks, Dysprosium, Directed self assembly, Source mask optimization, Optical proximity correction, Neodymium

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Visualization, Matrices, Computer simulations, 3D modeling, Photomasks, Optical proximity correction, Convolution, Feedback control, Semiconducting wafers, Model-based design

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Multilayers, Visualization, Manufacturing, Computer simulations, Optical proximity correction, SRAF, Feedback loops, Tolerancing, Overlay metrology, Resolution enhancement technologies

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