George Papavieros
at Institute of Nanoscience and Nanotechnology
SPIE Involvement:
Author
Publications (8)

SPIE Journal Paper | November 10, 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Scanning electron microscopy, Line edge roughness, Materials processing, Extreme ultraviolet, Line width roughness, Etching, Lithography, Image filtering, Material characterization, Image acquisition

SPIE Journal Paper | October 13, 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Line edge roughness, Scanning electron microscopy, Fractal analysis, Metrology, Edge roughness, Etching, Lithography, Image processing, Optical lithography, Image segmentation

PROCEEDINGS ARTICLE | March 30, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Image processing, Materials processing, Image acquisition, Scanning electron microscopy, Image filtering, Extreme ultraviolet, Line width roughness, Double patterning technology, Line edge roughness, Material characterization

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10589, Advanced Etch Technology for Nanopatterning VII
KEYWORDS: Lithography, Metrology, Optical lithography, Statistical analysis, Etching, Image processing, Image analysis, Scanning electron microscopy, Line edge roughness, Edge roughness

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Image segmentation, Image processing, Scanning electron microscopy, Fractal analysis, Line edge roughness, Edge roughness

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Optical lithography, Error analysis, Inspection, Scanning electron microscopy, Process control, Line width roughness, Line edge roughness, Edge roughness

Showing 5 of 8 publications
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