George Papavieros
COO at Nanometrisis PC
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 24 March 2020 Presentation
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Nanostructures, Metrology, Error analysis, Materials processing, Feature extraction, Atomic force microscopy, Scanning electron microscopy, 3D metrology, Process control, Nanoimprint lithography

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Modeling, Metrology, Statistical analysis, Computational modeling, Image segmentation, Image processing, Image acquisition, Computer simulations, Scanning electron microscopy, Nanoimprint lithography, Defect inspection

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Modeling, Computational modeling, Image segmentation, Manufacturing, Line width roughness, Optical proximity correction, Critical dimension metrology, Line edge roughness, Stochastic processes, Edge roughness

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Signal to noise ratio, Edge detection, Data modeling, Image processing, Denoising, Interference (communication), Scanning electron microscopy, Image filtering, Image denoising, Line edge roughness

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Edge detection, Detection and tracking algorithms, Data modeling, Matrices, Image processing, Denoising, Scanning electron microscopy, Machine learning, Line edge roughness, Algorithm development

Showing 5 of 13 publications
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