Dr. George P. Patsis
at Institute of Microelectronics
SPIE Involvement:
Author
Publications (20)

SPIE Journal Paper | October 1, 2010
JM3 Vol. 9 Issue 04
KEYWORDS: Polymers, Stochastic processes, Molecules, Surface roughness, Diffusion, Fractal analysis, Ionization, Laser sintering, Lab on a chip, Lithography

PROCEEDINGS ARTICLE | April 3, 2010
Proc. SPIE. 7641, Design for Manufacturability through Design-Process Integration IV
KEYWORDS: Mathematical modeling, Lithography, Manufacturing, Integration, Line width roughness, Transistors, Critical dimension metrology, Line edge roughness, Performance modeling, Design for manufacturability

PROCEEDINGS ARTICLE | March 31, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Polymers, Surface roughness, Ionization, Fractal analysis, Line edge roughness, Stochastic processes, Polymer thin films, Laser sintering, Correlation function

PROCEEDINGS ARTICLE | March 31, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Mathematical modeling, Polymers, Interfaces, Diffusion, Chemistry, Optical resolution, Line width roughness, Critical dimension metrology, Stochastic processes, Process modeling

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Refractive index, Image processing, Diffusion, Computer simulations, Photoresist materials, Double patterning technology, Algorithm development, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Etching, Silicon, 3D modeling, Photoresist materials, Line width roughness, Plasma etching, Line edge roughness, Photoresist processing, Anisotropic etching, Plasma

Showing 5 of 20 publications
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