Dr. Georgiy O. Vaschenko
at Cymer LLLC
SPIE Involvement:
Author
Publications (37)

PROCEEDINGS ARTICLE | October 3, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Extreme ultraviolet, High volume manufacturing

PROCEEDINGS ARTICLE | May 10, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Scanners, Reflectivity, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers, EUV optics, Plasma, Tin

PROCEEDINGS ARTICLE | May 5, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Current controlled current source

PROCEEDINGS ARTICLE | March 16, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Light sources, Laser energy, High power lasers, Amplifiers, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Pulsed laser operation, Plasma, Tin

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Mirrors, Scanners, Carbon dioxide lasers, Laser scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Plasma systems, Plasma, Tin

SPIE Journal Paper | June 29, 2012
JM3 Vol. 11 Issue 02
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Lithography, Tin, Reflectivity, Semiconducting wafers, Mirrors, Scanners, Gas lasers

Showing 5 of 37 publications
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