Dr. Gerard Luk-Pat
Corporate Applications Engineer at Synopsys Inc
SPIE Involvement:
Publications (19)

Proceedings Article | 18 March 2015 Paper
Jinhyuck Jun, Minwoo Park, Chanha Park, Hyunjo Yang, Donggyu Yim, Munhoe Do, Dongchan Lee, Taehoon Kim, Junghoe Choi, Gerard Luk-Pat, Alex Miloslavsky
Proceedings Volume 9427, 94270D (2015) https://doi.org/10.1117/12.2085460
KEYWORDS: Atrial fibrillation, Semiconducting wafers, Photomasks, Critical dimension metrology, Optical proximity correction, Nanoimprint lithography, Lithography, Printing, SRAF, Manufacturing

Proceedings Article | 12 April 2013 Paper
Christopher Cork, Alexander Miloslavsky, Paul Friedberg, Gerry Luk-Pat
Proceedings Volume 8683, 868308 (2013) https://doi.org/10.1117/12.2011548
KEYWORDS: Optical lithography, Metals, Photomasks, Double patterning technology, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Legal, Network architectures, Fractal analysis

Proceedings Article | 12 April 2013 Paper
Gerard Luk-Pat, Ben Painter, Alex Miloslavsky, Peter De Bisschop, Adam Beacham, Kevin Lucas
Proceedings Volume 8683, 868312 (2013) https://doi.org/10.1117/12.2011539
KEYWORDS: Metals, Photomasks, Printing, Optical lithography, Dielectrics, Etching, Lithography, Double patterning technology, Semiconducting wafers, Connectors

Proceedings Article | 13 March 2012 Paper
Proceedings Volume 8326, 83260D (2012) https://doi.org/10.1117/12.917986
KEYWORDS: Metals, Photomasks, Dielectrics, Optical lithography, Etching, Double patterning technology, Lithography, Photoresist materials, Capacitance, Tolerancing

Proceedings Article | 7 March 2012 Open Access Paper
Proceedings Volume 8327, 832703 (2012) https://doi.org/10.1117/12.920028
KEYWORDS: Optical lithography, Photomasks, Logic, Lithography, Double patterning technology, Etching, Immersion lithography, Cadmium sulfide, Metals, Dielectrics

Showing 5 of 19 publications
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