Dr. Gerard Luk-Pat
Manager, Corporate Applications Engineering at Synopsys Inc
SPIE Involvement:
Author
Publications (19)

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Lithography, Atrial fibrillation, Manufacturing, Printing, Photomasks, Optical proximity correction, SRAF, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Optical lithography, Etching, Metals, Dielectrics, Printing, Photomasks, Double patterning technology, Connectors, Semiconducting wafers

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Optical lithography, Metals, Legal, Fractal analysis, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, Network architectures

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Optical lithography, Etching, Metals, Dielectrics, Photoresist materials, Capacitance, Photomasks, Double patterning technology, Tolerancing

PROCEEDINGS ARTICLE | March 7, 2012
Proc. SPIE. 8327, Design for Manufacturability through Design-Process Integration VI
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Metals, Dielectrics, Photomasks, Cadmium sulfide, Double patterning technology, Immersion lithography

PROCEEDINGS ARTICLE | March 10, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Atrial fibrillation, Manufacturing, 3D modeling, Printing, Solids, Photomasks, Cadmium sulfide, Optical proximity correction, Critical dimension metrology, Model-based design

Showing 5 of 19 publications
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