Dr. Gerard Luk-Pat
Manager, Corporate Applications Engineering at Synopsys Inc
SPIE Involvement:
Author
Publications (19)

Proceedings Article | 18 March 2015 Paper
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Lithography, Atrial fibrillation, Manufacturing, Printing, Photomasks, Optical proximity correction, SRAF, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 12 April 2013 Paper
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Optical lithography, Etching, Metals, Dielectrics, Printing, Photomasks, Double patterning technology, Connectors, Semiconducting wafers

Proceedings Article | 12 April 2013 Paper
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Optical lithography, Metals, Legal, Fractal analysis, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, Network architectures

Proceedings Article | 13 March 2012 Paper
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Optical lithography, Etching, Metals, Dielectrics, Photoresist materials, Capacitance, Photomasks, Double patterning technology, Tolerancing

Proceedings Article | 7 March 2012 Paper
Proc. SPIE. 8327, Design for Manufacturability through Design-Process Integration VI
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Metals, Dielectrics, Photomasks, Cadmium sulfide, Double patterning technology, Immersion lithography

Showing 5 of 19 publications
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