Dr. Gerard M. Schmid
Senior Template Scientist at Canon Nanotechnologies Inc
SPIE Involvement:
Author
Publications (24)

Proceedings Article | 25 May 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Lithography, Contamination, Particles, Coating, Manufacturing, Inspection, Servomechanisms, Tantalum, Ozone, Defect inspection

Proceedings Article | 1 April 2010
Proc. SPIE. 7637, Alternative Lithographic Technologies II
KEYWORDS: Semiconductors, Lithography, Defect detection, Particles, Inspection, Optical inspection, Photomasks, Servomechanisms, Semiconducting wafers, Defect inspection

Proceedings Article | 23 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Data storage, Inspection, Magnetism, Head, Servomechanisms, Photoresist processing, Beam propagation method

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Lithography, Optical lithography, Silica, Data storage, Etching, Manufacturing, Magnetism, Chromium, Servomechanisms, Beam propagation method

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Etching, Scanning electron microscopy, Photomasks, Line width roughness, Critical dimension metrology, Line edge roughness, Semiconducting wafers

Showing 5 of 24 publications
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