The emergence of new high brilliance and high coherence facilities such as X-ray Free Electron Lasers (XFELs) and 4th generation synchrotrons open a new era in X-ray optics. Dynamical diffraction effects before disregarded are starting to play a role in the beam control of large scale facilities. In the case of XFEL facilities the temporal characteristics of the dynamical diffraction by thin perfect crystals can be used as a tool to generate femtosecond monochromatic pulses, in the case of self-seeding in the hard X-ray regime, but could even be used as method to characterize materials in this temporal range. In this contribution we present the first steps in the understanding of the spatial-displacement dependence of forward beams diffracted by thin crystals. The data collected by this technique is compared with crystal models based in dynamical diffraction theory. This type of study could open a new field to understand low strain materials in the femtosecond regime.
NanoMAX is a hard x-ray nanoimaging beamline at the new Swedish synchrotron radiation source MAX IV that became operational in 2016. Being a beamline dedicated to x-ray nanoimaging in both 2D and 3D, NanoMAX is the first to take full advantage of MAX IVs exceptional low emittance and resulting coherent properties. We present results from the first experiments at NanoMAX that took place in December 2016. These did not use the final experimental stations that will become available to users, but a temporary arrangement including zone plate and order-sorting aperture stages and a piezo-driven sample scanner. We used zone plates with outermost zone widths of 100 nm and 30 nm and performed experiments at 8 keV photon energy for x-ray absorption and fluorescence imaging and ptychography. Moreover, we investigated stability and coherence with a Ronchi test method. Despite the rather simple setup, we could demonstrate spatial resolution below 50 nm after only a few hours of beamtime. The results showed that the beamline is working as expected and experiments approaching the 10 nm resolution level or below should be possible in the future.
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