Dr. Gerardo Bottiglieri
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | October 12, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Mirrors, Scanners, Image resolution, Photomasks, Extreme ultraviolet, Transistors, Extreme ultraviolet lithography, Fiber optic illuminators

PROCEEDINGS ARTICLE | May 29, 2018
Proc. SPIE. 10694, Computational Optics II
KEYWORDS: Lithography, Diffraction, Lithographic illumination, Imaging systems, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Critical dimension metrology

PROCEEDINGS ARTICLE | October 30, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Mirrors, Reticles, Imaging systems, Scanners, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | October 20, 2016
Proc. SPIE. 10032, 32nd European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Scanners, Reflectivity, Image quality, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Wafer-level optics, Lithography, Reticles, Imaging systems, Scanners, Ions, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Neodymium, Semiconducting wafers

PROCEEDINGS ARTICLE | November 16, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Wafer-level optics, Lithography, Reticles, Imaging systems, Scanners, Ions, Image resolution, Photomasks, Extreme ultraviolet lithography, Source mask optimization, Nanoimprint lithography, Neodymium, Semiconducting wafers, EUV optics

Showing 5 of 7 publications
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